wet photoresist – SemiAnalysis

Lam Research, Tokyo Electron, JSR Battle It Out In The $5B+ EUV Photoresist, Coater, and Developer Market – CAR vs MOR vs Dry Resist

November 18, 2021November 18, 2021 Dylan Patel 0 Comments CaR, chemically amplified resist, dry deposit, dry develop, dry photo resist, Dry photoresist, dry resist, Lithius Pro Z, Metal oxide resist, MOR, photo resist, photoresist, spin coater, wet deposit, wet develop, wet photoresist

There is a battle brewing in the photoresist, coater, and developer market due to EUV advancement. This battle could cost Tokyo Electron their dominance over a $5B+ annual revenue market and lead to some photoresist companies such as TOK to lose a major market. JSR and Tokyo are bringing Metal Oxide Resist (MOR) to the market to fight off Lam Research’s encroachment with their dry resist technology.

DRAM Lam Logic

LAM Research (LRCX) Dry Deposit and Resist Could Become a Multi-Billion Dollar Business

May 22, 2020August 3, 2021 Dylan Patel 0 Comments dry deposit, dry develop, Dry photoresist, dry resist, LAM, LRCX, photoresist, wet deposit, wet develop, wet photoresist, wet resist

The dry photoresist technology LAM has developed could become a multiple billion dollars business by the end of the decade.